taking action to maintain the concentration of the surfactant in the process at a level where the dilution ratio of about 200 parts total BOE composition volume to about one part surfactant volume and wherein the chromogenic agent comprises 4,5,6,7-Tetrachloro-2′,4′,5′,7′-tetraiodofluorescein disodium salt.ġ2. correlating the absorbance of the surfactant in the sample with the concentration of the surfactant in the process and e. measuring the absorbance of the surfactant in the sample d. sampling fluid from the process, the sampling performed subsequent to the addition of the surfactant to the process and also before application of the surfactant to the microelectronic component, the sampling performed by drawing the sample into a side stream comprising a flow cell c. adding a surfactant to a process for making a microelectronic component, wherein an absorbance of the surfactant is capable of being measured, wherein the absorbance is ultraviolet-visible absorbance b. The method of claim 10 in which the spectrographic analysis comprises the steps of: a. The method of claim 9 in which the amount of BOE composition added to the etching process is adjusted so that an exact amount of ammonium fluoride and surfactant is applied to the wafer substrate.ġ1. The method of claim 8 in which the BOE composition further comprises a surfactant and the concentration of surfactant is determined by a spectrographic analysis.ġ0. The method of claim 2 in which the measurement involves an SIA analysis of a sample of BOE liquid used in an etching process on a wafer substrate.ĩ. The method of claim 6 in which the intensity of at least one of the detected peaks is mathematically related to the amount of ammonium fluoride present in the first liquid.Ĩ. The method of claim 4 in which the spectrometric measurement involves detecting of absorption peaks at specific pre-determined wavelengths of infrared, visible, and/or ultraviolet light emitted into the BOE composition.ħ. The method of claim 4 in which the spectrometric measurement involves detecting of absorption peaks of emitted visible, infrared, and ultraviolet light at about 420 and 600 nm.Ħ. The method of claim 2 in which the chromogenic agent is phenol red, chlorophenol red, thymol blue, bromocresol blue, rose Bengal, 4,5,6,7-Tetrachloro-2′,4′,5′,7′-tetraiodofluorescein disodium salt, and any combination thereof.ĥ.
#METTLER TOLEDO MP220 ELECTRODE FREE#
The method of claim 2 in which the BOE composition further comprises free HF and one of: HNO 3, H 2SiF 6, and NH 4F and any combination thereof and the equilibrium amount of free HF in relationship to HNO 3, H 2SiF 6, and NH 4F varies so the amount of free HF cannot be determined by stoichiometry.Ĥ. The method of claim 1 in which the BOE composition is a mixture of at least two different sources of BOE composition and the amount of ammonium fluoride in the composition cannot be determined by stoichiometry because the total amounts of ammonium fluoride mixed and/or volumes mixed are not known.ģ. A method of detecting and measuring the presence of ammonium fluoride in a BOE composition, the method comprising the steps of: collecting a representative sample of a BOE composition, adding a chromogenic agent to the composition, performing a spectrometric measurement of the composition, comparing the spectrometric measurement to pre-determined values to identify the quantity of ammonium fluoride in the BOE composition.Ģ. Method for fluorometrically monitoring and controlling water used in semiconductor chip productionġ.
![mettler toledo mp220 electrode mettler toledo mp220 electrode](https://m.media-amazon.com/images/I/610msqla4DL._AC_SL1500_.jpg)
Liquid etch endpoint detection and process metrology Method for automatically testing and controlling surface-active contents in aqueous solutions used in a process Method for thin film laser reflectance correlation for substrate etch endpoint Microfabricated devices for the storage and selective exposure of chemicals and devices Method and system for thin film characterization Interferometric endpoint determination in a substrate etching process Temperature stabilized optical cell and method Semiconductor device and method of making semiconductor device